Thermal Process
Thermal Processes
Thermal Processes (Annealing)
Good semi-quantitative/qualitative agreement in the trends of slip observation in the 200mm process and simulations is indicates that the modeling/simulation approach can be relied upon
Thermal Processes (Silicon Epitaxy)
The deposition uniformity is determined by the azimuthal average as wafer rotates during deposition. The reactor Hydrodynamics strongly influences the epitaxy process
